ADVANCED OXIDATION AND
CONTACTLESS SURFACE CLEANING

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Deep UV light (172 nm in this case) produces ozone (O3) when used in air. The presence of ozone AND deep UV radiation facilitates breakdown of organic compounds such as fingerprints. The fingerprint on the quartz substrate above was removed by exposure to a 172 nm lamp operating at about 17 mW/cm2.

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Fingerprint removed, in addition to some of the Sharpie marks. The organics are turned into H2O and CO2 leaving a clean surface.